ALD Deposition System Configurator

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      ALD Deposition System Configurator
      Choose the maximum subsrate size. All substrates with sizes smaller than the maxium substrate size can be processed as well as very small samples on top of a carrier
      Choose a RF showerhead source for medium plasma density, ICP source for high plasma dencity and ECR Hollow Cathode source for very high plasma density.
      Choose 600W or 1KW for RF showerhead, ICP and ECR Hollow head or choose 3KW for the Microwave head
      Choose the 400ºC option for typical ALD for most oxides because balances reactivity and thermal budget or the 600ºC if crystallinity is the most important factor or lower impurity levels
      The 10mtorr option uses only a dry scroll pump. The other two options are using an adequate turbomolecular pump, backed up with Dry Scroll pump and N2 slow vent. The vacuum of the system is monitored in real time with a wide range gauge while the deposition process is monitored in real time with a Baratron type gauge.
      Cjoose the QCM option for good precision on the end detection limit, interferometry for high precision end limit detection of transpoarent films and ellipsometry for thickness or optical constants end limit detection
      Gas Flow Control
      In the standard setup there is one N2 MFC included for purging the precursors lines. Choose the Ar MFC in case you need PEALD and any other additional gas supply if needed. All MFCs come with with SS gas lines and pneumatic shut-off valves.
      50ml cylinders. Manual valves are provided for replacement of cylinders. Fast ALD valves are provided for pulsed delivery. Each bubbler can easily and safely be removed after line and precursor manual valves are closed and line is flushed with N2. All bubblers are enclosed in a vented cabinet with glove box configuration underneath the process chamber inside the SS system cabinet. Cylinders, manifold and gas lines are heated
      Ozone can be generated in the plasma source by introducing oxygen to the plasma source or an external ozone generator can be attached to the system
      ALD Filter
      Large surface filter (heated) between the chamber and the turbo to capture unreacted precursors before reaching the pump.
      Load Lock with linear drive, pneumatic isolation door, 70l/sec turbo pump backed up with dry pump and gauge, for single wafers or for wafer cassettes (for 8 wafers)
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