“The aim of the investigation is to study the influence of different parameters of magnetron sputtering on the structure and chemical composition of titanium and titanium alloy surfaces used for endosseous implantation. Materials and Methods. The study involved the use of the NSC-3500 magnetron sputtering system (NANO-MASTER Inc., USA) providing the possibility to obtain coatings of almost any metals, alloys and semiconductors materials without a shift in the stoichiometric composition. High-purity argon (99.99%) was used as the sputtering gas. A high-purity titanium (99.99%) target was used as the source of the coating material. Polished titanium washers of Grade IV and Grade V (according to ASTM) were used as substrates for growing titanium coatings….)”

https://cyberleninka.ru/article/n/the-influence-of-different-parameters-of-magnetron-sputtering-on-the-structure-and-chemical-composition-of-titanium-alloy-implant-surfaces